Update hole punch logic in HWUI

--Updated HWUI holepunch logic for SurfaceView to
also apply the stretch to the hole punch
--Updated RenderNode callbacks to also include
an offset from the ancestor RenderNode that also
has a stretch configured on it
--Added new test activity to verify hole punch
logic

Bug: 179047472
Test: manual
Change-Id: Ibbaf8248a31839ba9dc352ecb9fef54e1276918e

1 files changed, 4 insertions, 0 deletions

diff --git a/libs/hwui/RenderNode.h b/libs/hwui/RenderNode.h
index 988141fe191d..6a0b1aafd7c7 100644
--- a/libs/hwui/RenderNode.h
+++ b/libs/hwui/RenderNode.h
@@ -40,6 +40,7 @@
 #include "pipeline/skia/SkiaLayer.h"
 
 #include <vector>
+#include <pipeline/skia/StretchMask.h>
 
 class SkBitmap;
 class SkPaint;
@@ -127,6 +128,8 @@ public:
         }
     }
 
+    StretchMask& getStretchMask() { return mStretchMask; }
+
     VirtualLightRefBase* getUserContext() const { return mUserContext.get(); }
 
     void setUserContext(VirtualLightRefBase* context) { mUserContext = context; }
@@ -286,6 +289,7 @@ private:
     UsageHint mUsageHint = UsageHint::Unknown;
 
     bool mHasHolePunches;
+    StretchMask mStretchMask;
 
     // METHODS & FIELDS ONLY USED BY THE SKIA RENDERER
 public: